Spectroscopic Ellipsometer for Micro-area Pattern Structure Measurement Spectroscopic Ellipsometer Instrument

Spectroscopic Ellipsometer for Micro-area Pattern Structure Measurement Spectroscopic Ellipsometer Instrument

I. Overview

LR-SE-M is a dedicated spectroscopic ellipsometer customized for the semiconductor industry for micro-area pattern structure measurement. It adopts 1. ultra-miniature light spot detection measurement technology and 2. customized ultra-fast measurement speed technology. It can be applied to the measurement of n/k/d of anti-reflection films, conductive films and other thin films on various transparent substrates, and is perfectly suitable for the optical parameter analysis of various micro-area patterns.

II. Special Features

1. The spot size can be customized, with the minimum reaching 30um.

2. Ultra-fast measurement, with a single measurement time of less than 0.5 seconds;

3. The series configuration is flexible and supports customized functional design.

4. Compact structure, more suitable for online integrated measurement.

III. Measurement Examples

Microstructure measurement of captured area in the image

Spectroscopic Ellipsometer for Micro-area Pattern Structure Measurement Spectroscopic Ellipsometer Instrument

Technical Specification